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Keynote Speakers


Toshiaki Kirihata

IBM Corporation, NY, USA
System Scaling Technology Design Department Manager

3 Dimensional Memory

Semiconductor technology has scaled successfully for 30 years enablingtoday's Peta-Flop super computing. However, scaling has become increasingly difficult and expensive, and while post-Si CMOS technologies may some day overcome current challenges, they are still in the early phase of research. This talk will describe orthogonal scaling through the 3D memory development. We will review the evolution of semiconductor scaling including SOI, FIN, and embedded DRAM solution for high-performance logic technology. We will then explain the 3D stacking of embedded DRAM cache prototypes using Through-Silicon-Vias (TSV) and review today's Hybrid-Memory Cube (HMC) and High-Banwidth Memory (HBM) modules targeting high-performance main memory applications. Final comments on the challenges for 3D memory using wafer-scaling 3D integration will conclude the talk.

Toshiaki Kirihata, senior member of the IEEE, received the B.S. and M.S. degrees in precision engineering from Shinshu University, Nagano, Japan, in 1984 and 1986, respectively. In 1986, he joined IBM Tokyo Research Laboratory. In 1993 he served as Lead Engineer for the IBM Toshiba Siemens 256-Mb DRAM development at IBM, East Fishkill, NY. He joined IBM Research T. J. Watson Research Center in November 1996 and continued work on the 390- mm2 1-Gb DDR and 512-Mb DDR2 SDRAMs as a Product Design Team Leader. In 2000 he transferred to the IBM Semiconductor Research and Development Center IBM East Fishkill where he served as manager for the development of high performance embedded DRAM technology. Mr. Kirihata presented papers at the ISSCC conferences and the paper entitled "A 500MHz Random Cycle, 1.5ns Latency, SOI Embedded DRAM macro Featuring a Three Transistor Micro Sense Amplifier" received the Lewis Winner outstanding paper award. He is currently a senior technical staff member for IBM Systems & Technology Group where he manages the IBM East Fishkill design department for high performance embedded DRAM and 3D memory. His research interest includes an hard-ware security using embedded DRAM.



Shin-Puu Jeng

Taiwan Semiconductor Manufacturing Co., Ltd. (TSMC), Taiwan
Director of 3DIC/IIPD Division

3DIC Technology – CoWoS as an Example

3D IC is a highly anticipated technology to enhance the overall chip performance and to achieve heterogeneous system integration by way of three-dimensional chips stacking using through-silicon-vias (TSV). Today, most of the technology barriers of 3D IC, from process standpoint, have been overcome, and products with fine-pitch TSV are recently demonstrated. However, the extensive use of this technology still depends on factors, such as the availability of stacked memory, design ecosystem, test methodology, thermal solutions and cost. In particular, challenges in heterogeneous chip integration involve dies from different sources, and, possibly, complicated chip-package-interaction (CPI) is needed to be resolved. CoWoS technology is a simplified 3D IC integration supply chain, which is able to quickly improve and stabilize the overall yield, and reduce the reliability risks. The technology is ideal for thin wafer integration flow, as the thin TSV wafer is always protected. The wafer level integration minimizes warpage, which is critical for μ-bump stacking yield and reliability. The advantages of CoWoS get better for larger size chips. The design reference flow is deployed, and full design methodology and kits are ready. The CoWoS technology passed package and product qual on multiple products, and achieved excellent yield in production.

Dr. Shin-Puu Jeng is currently the Director of 3DIC/IIPD Division in TSMC. Prior to joining TSMC, he worked at Applied Materials and Texas Instruments. He did his post-doctoral studies at Yale University. He holds a doctoral degree in Materials Science and Engineering from the University of Florida in Gainesville (USA). Dr. Jeng won the National Industrial Innovation Award (Taiwan, ROC) and Outstanding Engineer Award (Chinese Institute of Engineers) in 2012 and 2014, respectively.




Chris Bailey

University of Greenwich, London, United Kingdom
Professor of Computational Mechanics and Reliability

Reliability of Bonding Technologies for Power Electronics Modules

Power electronics covers various disciplines, especially semiconductor, circuit design, thermal design (heat transfer, fluid flow), electromagnetics (EMI, Inductors, transformers), digital electronics, control theory, and materials science in the context of packaging and reliability engineering. It also covers a wide range of power (mW to MW), temperature (-55C to 275C), frequencies (DC to GHz) and dimensions (um to km). This presentation will discuss traditional packaging technologies for power electronics modules such as IGBT’s where both wire bonding and solder bonding technologies have been used. In addition the presentation will detail new bonding technologies such as low process temperature bonding techniques (e.g. silver sintering and transient liquid phase bonding). Challenges with regards the use of these bonding technologies on overall module reliability will be discussed both for silicon devices and wide band gap devices such as silicon carbide.

Professor Bailey is Director of the Computational Mechanics and Reliability Group at the University of Greenwich, London, United Kingdom. He received his PhD in Computational Modelling in 1988, and an MBA in Technology Management in 1996. He has published over 200 papers on Design and Simulation of micro/nano-technology based processes and products and has worked on many UK and EU projects. Chris is also a member of the Board of Governors for IEEE CPMT and is UK Chapter Chair for the IEEE CPMT and Reliability Societies. Chris is also co-chair of the IEEE Nanopackaging committee and this year will host the 20th anniversary of the IEEE THERMINIC conference in Greenwich, London.




Mark S Goorsky

University of California, Los Angeles, CA, USA
Professor of Materials Science and Engineering

Wafer Bonding Technologies for Photovoltaic and Other Energy Aapplications

Recent achievements in photovoltaic solar cell record efficiencies have been achieved using wafer bonding techniques. Here, we discuss a low thermal budget process to achieve high electrical and thermal conductivities across III-V bonded interfaces using sulfur-based passivation techniques. We have determined several interesting properties of these bonded interfaces: (i) any pre-existing planar oxide (e.g., for GaAs) at the bonding interface migrates to form three dimensional-sphere-like structures at very low temperatures (< 400 °C); (ii) high electrical conductivity bonds across GaAs-like interfaces and InP-like interfaces are achieved during temperatures that are necessary for ohmic alloying steps (400 °C – 600 °C, minutes) and (iii) the relative orientation of the lattice planes on either side of the bond influence the conductivity across the interface. These results have led to an understanding of the thermal and electrical stability of III-V bonded interfaces and guide the way for the incorporation of II-V materials in other energy applications as well as power and logic applications.

Mark Goorsky is a Professor of Materials Science and Engineering at UCLA. He received his Ph.D. in Materials Science and Engineering in 1989 from the Massachusetts Institute of Technology, and his B.S. in MSE in 1984 from Northwestern University. He held a post-doctoral position at the IBM Thomas J. Watson Research Center (Jan. 1989 - June 1991) and started at UCLA in 1991. He was chair of MSE at UCLA from 2004-2009.
His research focuses on several aspects of materials integration through wafer bonding and the relationship between materials defects and device performance in semiconductor structures. He is an associate editor of the Journal of Crystal Growth, and a member of the United States Air Force Scientific Advisory Board. He was awarded the T.S. Walton Award from the Science Foundation of Ireland in 2010 (where he participated in projects to understand the integration of germanium and III-Vs with silicon), the TRW Outstanding Young Teacher Award in the School of Engineering and Applied Science in 1993, the National Science Foundation CAREER Award in 1995, and the Northrop Grumman Outstanding Young Researcher Award in 1996.
Goorsky is also active in education outreach. He leads activities for grade school and high school students through organizations such as the Society of Latino Engineers and Scientists, the American Indian Science and Engineering Society, and the National Society of Black Engineers. He received the UCLA Center for Excellence in Engineering and Diversity (CEED) Award for Outstanding Service to K-16 Science Education.




M. Jamal Deen

McMaster University, Hamilton, ON, CANADA
Professor of Electrical and Computer Engineering, Professor of Biomedical Eengineering,
Senior Canada Research Chair in information technology

Nanobonding - A Key Technology for Emerging Applications in Health and Environment

Heterogeneous integration of electronic, photonic, optical, fluidic and mechanical components is urgently needed for real-world health and environmental applications. However, integration of these diverse technologies into a single packaged system is a very challenging task. In such integrated systems, further challenges appear from the requirements of maintaining the performance of the components with high reliability, and without heating or pressure during the integration process. To address the integration issues, we have established the unique Micro- and Nano-Systems Laboratory (MNSL) at McMaster University. In this presentation, we will introduce the MNSL with a focus on our processing and integration capabilities, and will also briefly describe our characterization facilities. The nanobonding technologies we are pursuing provide void-free, strong, and nanoscale bonding at room temperature or at low process temperatures, and do not require chemicals, adhesives, or high external pressure. With this nanobonding as a key enabling technology, we will discuss several examples of the integration of various soft and hard materials such as silicon, silicon carbide, germanium, gallium arsenide, glass, polymers and gratings. These substrates are being used to create, for example, electronic (silicon), photonic (silicon and gallium arsenide), micro-electro-mechanical (glass and silicon) and fluidic (silicon and glass and PDMS and SU-8) components for our biosensing and bioimaging systems. Details of some of these systems – a low-cost, high performance miniaturized biosensing system for pathogen detection, a biophotonic imaging system for the screening and early detection of tumors or cancers, and a micro-Raman system for environmental applications will be presented and discussed.

M. Jamal Deen was born in Georgetown, Guyana, South America. He received the Ph.D. degree in electrical engineering and applied physics from Case Western Reserve University, Cleveland, OH, USA. and received the Dr. Eng. (honoris causa) degree from the University of Waterloo, from the Universidad de Granada, and from the Universitat Rovira I Virgili, Tarragona, Spain for his exceptional scholarly achievements and service contributions, and exemplary professionalism. He was an NSERC Senior Industrial Fellow and is a Distinguished Lecturer of the IEEE Electron Device Society for more than a decade. His other awards and honors include the Thomas D. Callinan Award as well as the Electronics and Photonics Division Award from the Electrochemical Society; the Distinguished Researcher Award, Province of Ontario; a Humboldt Research Award from the Alexander von Humboldt Foundation; an IBM Faculty Award; the Eadie Medal from the Royal Society of Canada; and the McNaughton Gold Medal, the Fessenden Silver Medal as well as the Ham Education Medal from IEEE Canada. Dr. Deen’s research interests include nanoelectronics, optoelectronics, nanotechnology, and their emerging applications in health and environmental sciences. Dr. Deen has been elected by his peers as Fellow of nine national academies and professional societies including of The Royal Society of Canada (FRSC), the National Academy of Sciences India (FNASI-Foreign), the Institute of Electrical and Electronic Engineers (FIEEE), the American Physical Society (FAPS), and the Electrochemical Society (FECS). He was also elected an Honorary Member of the World Innovation Foundation—the foundation’s highest honor.







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